Available online 11 September 2009.
This paper describes the mechanical properties of poly (polycrystalline) 3C-SiC thin films with N2 in situ doping. In this work, in situ doped poly 3C-SiC film was deposited by using the atmospheric pressure chemical vapor deposition (APCVD) method at 1200 °C using single-precursor hexamethyildisilane: Si2(CH3)6 (HMDS) as Si and C precursors, and 0100 sccm N2 as the dopant source gas. The mechanical properties of doped poly 3C-SiC thin films were measured by nano-indentation. Young's modulus and hardness were measured to be 285 and 35 GPa at 0 sccm N2, respectively. Young's modulus and hardness decreased with increasing N2 flow rate. Surface morphology was evaluated by atomic force microscopy (AFM) according to N2 flow rate.
Keywords: Poly 3C-SiC; Nano-indentor; Young's modulus; Hardness; In situ doping
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